TS-1 was synthesized using TPABr as the template. Different silica sources, bases AND different procedures to prepare the gel were used.
以TPABr为模板剂，采用多种硅源、碱源和不同配料方式合成了钛硅分子筛TS-1，系统研究了合成中的规律和影响因素。

Abstract: Molecular deposition (MD) film, a nano film, is assembled by the interaction of static charge between cationic and anionic compounds.The micro-friction properties of an MD film on silica has been studied with atomic force microscope (AFM).I
文摘:利用原子力显微镜对石英岩表面单层分子沉积膜的微观摩擦特性进行了研究，发现该分子沉积膜具有一定的减摩性.通过对其表面力-位移曲线、表面形貌像、调制力像和摩擦力像的进一步分析表明，石英岩表面分子沉积膜具有减摩作用的原因在于它能够降低表面的粘着力并对表面具有微观修饰作用.

The commercial product however, containing silica and silicates, HAS a positive effect
然而含有硅石和硅酸盐的工业品都有肯定的效果。

Frictional behavior IS modified by colloidal silica or starch deposition
耐磨损性能可以通过在织物上沉淀胶状硅或淀粉一类物质而得到改善。

The crude oil IS chromatographed over silica gel
粗制油状物用硅胶进行色谱分离。

The oxidation rates are fastest In freshly cleaned silica vessels
在新清洗的二氧化硅容器中，氧化速度是最快的。

A siliceous rock of chalcedonic or opalIne silica occurrIng In limestone.
硅石出现在灰岩中的玉髓或蛋白色硅石

The free hydroxyl ion is Involved In a further reaction with the silica network
游离的氢氧离子会进一步和硅氧网络反应。

The maIn unwanted impurities In iron ores Include silica and silicates, alumIna and alumInares, sulfur, phosphorus and arsenic, and moisture.
铁矿石中的主要无用杂质有硅石和硅酸盐，氧化铝和铝酸盐，硫，磷和砷，以及水分。

Silicon, naturally occurring in the form of silica and silicates, is the MOST important semiconductor for the electronics industry
在自然界从硅酸盐和二氧化硅形式存在的硅是电子工业中最重要的半导体原材料。